plasma chemical vapor deposition
英 [ˈplæzmə ˈkemɪkl ˈveɪpə(r) ˌdepəˈzɪʃn]
美 [ˈplæzmə ˈkemɪkl ˈveɪpər ˌdepəˈzɪʃn]
网络 等离子体化学气相沉积; PCVD法; 等离子体化学气相沉积法
双语例句
- A microwave plasma chemical vapor deposition method was used to deposit a-Si: H films at high rate.
本文报道了用微波等离子体化学气相淀积（MP&CVD）技术从SiH4+H（？）进行a-Si∶H薄膜的高速淀积研究。 - A very important application areas is microwave plasma chemical vapor deposition ( MPCVD).
其中一个很重要的应用领域便是微波等离子体化学气相沉积（MPCVD）。 - Ultrafine TiO_2 particles were synthesized by TiCl_4 and O_2 in radio frequency plasma chemical vapor deposition reactor.
利用TiCl＿4＋O＿2体系，在高频等离子体化学气相淀积反应器中合成了纯度高、粒度细的TiO＿2粒子。 - The homogeneity of single mode optical fibers made by the PCVD ( Plasma Chemical Vapor Deposition) process is studied.
研究了用等离子体化学汽相沉积工艺（PCVD）制备单模光纤的均匀性问题。 - The cubic boron nitride films have been synthesized by hot filament assisted RF plasma chemical vapor deposition ( CVD) from the reactive gases of B_2H_6 and NH_3 on silicon substrate.
本文研究了热灯丝射频等离子体CVD法合成的立方氮化硼薄膜（c－BN），反应气体是8＿2H＿6和NH＿3，衬底材料为Si单晶。 - Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.
大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜，有效地提高了沉积速率和膜品质。 - Smoothing, dense and uniform nano crystalline diamond like carbon films are prepared by using electron cyclotron resonance ( ECR) microwave acetone plasma chemical vapor deposition ( CVD) method.
利用电子回旋共振（ECR）微波等离子体辅助化学气相沉积技术、工作气氛为丙酮，在光学玻璃衬底上得到了光滑、致密、均匀的类金刚石薄膜。 - Diamond like carbon ( DLC) films were prepared by middle frequency plasma vapor deposition method from different hydrocarbon source gases at varying voltages using the plasma chemical vapor deposition system.
本文用改装的等离子体化学气相沉积系统，采用中频等离子体气相沉积技术沉积了类金刚石碳（DLC）膜。 - Atmospheric-pressure Plasma Chemical Vapor Deposition for Polycrystalline Silicon Preparation from SiCl_4 and OES Diagnosis
由SiCl4制备多晶硅的大气压等离子体化学气相沉积及发射光谱诊断 - Study on Synthetic Silica Glass by Plasma Chemical Vapor Deposition
等离子体化学气相沉积合成石英玻璃的基础研究